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Effects of Methane Gas Flow Rate on the Optoelectrical Properties of Nitrogenated Carbon Thin Films Grown by Surface Wave Microwave Plasma Chemical Vapor Deposition
Effects of Methane Gas Flow Rate on the Optoelectrical Properties of Nitrogenated Carbon Thin Films Grown by Surface Wave Microwave Plasma Chemical Vapor Deposition
Effects of Methane Gas Flow Rate on the Optoelectrical Properties of Nitrogenated Carbon Thin Films Grown by Surface Wave Microwave Plasma Chemical Vapor Deposition
Rusop, M. (author) / Abdullah, S. (author) / Omer, A. M. M. (author) / Adhikari, S. (author) / Soga, T. (author) / Jimbo, T. (author) / Umeno, M. (author)
SURFACE REVIEW AND LETTERS ; 13 ; 585-592
2006-01-01
8 pages
Article (Journal)
English
DDC:
530.417
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