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Effects of annealing temperature on the optical, bonding, structural and electrical properties of nitrogenated amorphous carbon thin films grown by surface wave microwave plasma chemical vapor deposition
Effects of annealing temperature on the optical, bonding, structural and electrical properties of nitrogenated amorphous carbon thin films grown by surface wave microwave plasma chemical vapor deposition
Effects of annealing temperature on the optical, bonding, structural and electrical properties of nitrogenated amorphous carbon thin films grown by surface wave microwave plasma chemical vapor deposition
Rusop, M. (author) / Omer, A. M. (author) / Adhikari, S. (author) / Adhikary, S. (author) / Uchida, H. (author) / Soga, T. (author) / Jimbo, T. (author) / Umeno, M. (author)
JOURNAL OF MATERIALS SCIENCE ; 41 ; 537-547
2006-01-01
11 pages
Article (Journal)
English
DDC:
620.11
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