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An investigation of natural oxidation process on stain-etched nanoporous silicon by micro-Raman spectroscopy

Abramof, P. G. / Miranda, C. R. / Beloto, A. F. / Ueta, A. Y. / Ferreira, N. G.

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An investigation of natural oxidation process on stain-etched nanoporous silicon by micro-Raman spectroscopy

Abramof, P. G. / Miranda, C. R. / Beloto, A. F. / Ueta, A. Y. / Ferreira, N. G.

An investigation of natural oxidation process on stain-etched nanoporous silicon by micro-Raman spectroscopy

Abramof, P. G. / Miranda, C. R. / Beloto, A. F. / Ueta, A. Y. / Ferreira, N. G.

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Check availability in my library

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Document information

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Document information

Title:

An investigation of natural oxidation process on stain-etched nanoporous silicon by micro-Raman spectroscopy

Contributors:

Abramof, P. G. (author) / Miranda, C. R. (author) / Beloto, A. F. (author) / Ueta, A. Y. (author) / Ferreira, N. G. (author)

Published in:

APPLIED SURFACE SCIENCE ; 253 ; 7065-7068

Publication date:

2007-01-01

Size:

4 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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