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    Fabrication and characterization of Ge nanocrystalline growth by ion implantation in SiO2 matrix

    New search for: Mestanza, S. N.
    New search for: Doi, I.
    New search for: Swart, J. W.
    New search for: Frateschi, N. C.

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    Fabrication and characterization of Ge nanocrystalline growth by ion implantation in SiO2 matrix

    New search for: Mestanza, S. N.
    New search for: Doi, I.
    New search for: Swart, J. W.
    New search for: Frateschi, N. C.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Fabrication and characterization of Ge nanocrystalline growth by ion implantation in SiO2 matrix

    New search for: Mestanza, S. N.
    New search for: Doi, I.
    New search for: Swart, J. W.
    New search for: Frateschi, N. C.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Fabrication and characterization of Ge nanocrystalline growth by ion implantation in SiO2 matrix

    Contributors:

    Mestanza, S. N. (author) / Doi, I. (author) / Swart, J. W. (author) / Frateschi, N. C. (author)

    Published in:

    JOURNAL OF MATERIALS SCIENCE ; 42 ; 7757-7761

    Publication date:

    2007-01-01

    Size:

    5 pages

    ISSN:

    0022-2461

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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