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    Effect of O2 gas partial pressure on structures and dielectric characteristics of rf sputtered ZrO2 thin films

    New search for: Ma, C. Y.
    New search for: Lapostolle, F.
    New search for: Briois, P.
    New search for: Zhang, Q. Y.

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    Effect of O2 gas partial pressure on structures and dielectric characteristics of rf sputtered ZrO2 thin films

    New search for: Ma, C. Y.
    New search for: Lapostolle, F.
    New search for: Briois, P.
    New search for: Zhang, Q. Y.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Effect of O2 gas partial pressure on structures and dielectric characteristics of rf sputtered ZrO2 thin films

    New search for: Ma, C. Y.
    New search for: Lapostolle, F.
    New search for: Briois, P.
    New search for: Zhang, Q. Y.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

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    Check availability in my library
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    Document information
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    Document information
    Title:

    Effect of O2 gas partial pressure on structures and dielectric characteristics of rf sputtered ZrO2 thin films

    Contributors:

    Ma, C. Y. (author) / Lapostolle, F. (author) / Briois, P. (author) / Zhang, Q. Y. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 253 ; 8718-8724

    Publication date:

    2007-01-01

    Size:

    7 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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