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Microstructural improvement of sputtered ZrO2 thin films by substrate biasing

Huang, A. P. / Chu, P. K.

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Microstructural improvement of sputtered ZrO2 thin films by substrate biasing

Huang, A. P. / Chu, P. K.

Microstructural improvement of sputtered ZrO2 thin films by substrate biasing

Huang, A. P. / Chu, P. K.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Microstructural improvement of sputtered ZrO2 thin films by substrate biasing

Contributors:

Huang, A. P. (author) / Chu, P. K. (author)

Published in:

MATERIALS SCIENCE AND ENGINEERING B -LAUSANNE- ; 121 ; 244-247

Publication date:

2005-01-01

Size:

4 pages

ISSN:

0921-5107

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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