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Effect of Generation and Soft Lithography on Semiconducting Dendrimer Lasers

Lawrence, J. R. / Namdas, E. B. / Richards, G. J. / Burn, P. L. / Samuel, I. D.

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Effect of Generation and Soft Lithography on Semiconducting Dendrimer Lasers

Lawrence, J. R. / Namdas, E. B. / Richards, G. J. / Burn, P. L. / Samuel, I. D.

Effect of Generation and Soft Lithography on Semiconducting Dendrimer Lasers

Lawrence, J. R. / Namdas, E. B. / Richards, G. J. / Burn, P. L. / Samuel, I. D.

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Check availability in my library

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Document information

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Document information

Title:

Effect of Generation and Soft Lithography on Semiconducting Dendrimer Lasers

Contributors:

Lawrence, J. R. (author) / Namdas, E. B. (author) / Richards, G. J. (author) / Burn, P. L. (author) / Samuel, I. D. (author)

Published in:

ADVANCED MATERIALS -DEERFIELD BEACH THEN WEINHEIM- ; 19 ; 3000-3003

Publication date:

2007-01-01

Size:

4 pages

ISSN:

0935-9648

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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Dendrimer-Based Self-Assembled Monolayers as Resists for Scanning Probe Lithography

Tully, D. C. / Wilder, K. / Frechet, J. M. J. et al. | British Library Online Contents | 1999

Semiconducting (Conjugated) Polymers as Materials for Solid-State Lasers

McGehee, M. D. / Heeger, A. J. | British Library Online Contents | 2000