Effect of Argon Pressure on Structure and Properties of ZnO:Al Films Deposited by DC Magnetron Sputtering: Fid-Bau Portal

Effect of Argon Pressure on Structure and Properties of ZnO:Al Films Deposited by DC Magnetron Sputtering

Xu, J.-w. / Wang, H. / Ren, M.-f. / Cheng, J.

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Effect of Argon Pressure on Structure and Properties of ZnO:Al Films Deposited by DC Magnetron Sputtering

Xu, J.-w. / Wang, H. / Ren, M.-f. / Cheng, J.

Effect of Argon Pressure on Structure and Properties of ZnO:Al Films Deposited by DC Magnetron Sputtering

Xu, J.-w. / Wang, H. / Ren, M.-f. / Cheng, J.

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Document information

Title:

Effect of Argon Pressure on Structure and Properties of ZnO:Al Films Deposited by DC Magnetron Sputtering

Contributors:

Xu, J.-w. (author) / Wang, H. (author) / Ren, M.-f. (author) / Cheng, J. (author)

Published in:

MATERIALS SCIENCE AND ENGINEERING -HANGZHOU- ; 25 ; 764-767

Publication date:

2007-01-01

Size:

4 pages

ISSN:

1004-793X

Type of media:

Article (Journal)

Type of material:

Language:

Unknown

Classification:

DDC: 620.11

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