Highly Conductive/Transparent ZnO:Al Thin Films Deposited at Room Temperature by rf Magnetron Sputtering: Fid-Bau Portal

Highly Conductive/Transparent ZnO:Al Thin Films Deposited at Room Temperature by rf Magnetron Sputtering

Fortunato, E. / Nunes, P. / Marques, A. / Costa, D. / Aguas, H. / Ferreira, I. / Costa, M. E. V. / Martins, R.

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Highly Conductive/Transparent ZnO:Al Thin Films Deposited at Room Temperature by rf Magnetron Sputtering

Fortunato, E. / Nunes, P. / Marques, A. / Costa, D. / Aguas, H. / Ferreira, I. / Costa, M. E. V. / Martins, R.

Highly Conductive/Transparent ZnO:Al Thin Films Deposited at Room Temperature by rf Magnetron Sputtering

Fortunato, E. / Nunes, P. / Marques, A. / Costa, D. / Aguas, H. / Ferreira, I. / Costa, M. E. V. / Martins, R.

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Title:

Highly Conductive/Transparent ZnO:Al Thin Films Deposited at Room Temperature by rf Magnetron Sputtering

Contributors:

Fortunato, E. (author) / Nunes, P. (author) / Marques, A. (author) / Costa, D. (author) / Aguas, H. (author) / Ferreira, I. (author) / Costa, M. E. V. (author) / Martins, R. (author) / Vieira, T.

Published in:

Proceedings of the 1^s^t International Materials Symposium, Coimbra, Portugal, April 9-11, 2001 ; 571-574

KEY ENGINEERING MATERIALS

Publication date:

2002-01-01

Size:

4 pages

ISSN:

1013-9826

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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