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Chemical vapor deposition of ZrxTi1-xO2 and HfxTi1-xO2 thin films using the composite anhydrous nitrate precursors
Chemical vapor deposition of ZrxTi1-xO2 and HfxTi1-xO2 thin films using the composite anhydrous nitrate precursors
Chemical vapor deposition of ZrxTi1-xO2 and HfxTi1-xO2 thin films using the composite anhydrous nitrate precursors
Shao, Q. Y. (author) / Li, A. D. (author) / Dong, Y. (author) / Fang, F. (author) / Jiang, J. Q. (author) / Liu, Z. G. (author)
APPLIED SURFACE SCIENCE ; 254 ; 2224-2228
2008-01-01
5 pages
Article (Journal)
English
DDC:
621.35
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