Dense Self-Assembly on Sparse Chemical Patterns: Rectifying and Multiplying Lithographic Patterns Using Block Copolymers: Fid-Bau Portal

Dense Self-Assembly on Sparse Chemical Patterns: Rectifying and Multiplying Lithographic Patterns Using Block Copolymers

Cheng, J. Y. / Rettner, C. T. / Sanders, D. P. / Kim, H. C. / Hinsberg, W. D.

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Dense Self-Assembly on Sparse Chemical Patterns: Rectifying and Multiplying Lithographic Patterns Using Block Copolymers

Cheng, J. Y. / Rettner, C. T. / Sanders, D. P. / Kim, H. C. / Hinsberg, W. D.

Dense Self-Assembly on Sparse Chemical Patterns: Rectifying and Multiplying Lithographic Patterns Using Block Copolymers

Cheng, J. Y. / Rettner, C. T. / Sanders, D. P. / Kim, H. C. / Hinsberg, W. D.

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Check availability in my library

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Document information

Title:

Dense Self-Assembly on Sparse Chemical Patterns: Rectifying and Multiplying Lithographic Patterns Using Block Copolymers

Contributors:

Cheng, J. Y. (author) / Rettner, C. T. (author) / Sanders, D. P. (author) / Kim, H. C. (author) / Hinsberg, W. D. (author)

Published in:

ADVANCED MATERIALS -DEERFIELD BEACH THEN WEINHEIM- ; 20 ; 3155-3158

Publication date:

2008-01-01

Size:

4 pages

ISSN:

0935-9648

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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