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    Highly Versatile and Robust Materials for Soft Imprint Lithography Based on Thiol-ene Click Chemistry

    New search for: Campos, L. M.
    New search for: Meinel, I.
    New search for: Guino, R. G.
    New search for: Schierhorn, M.
    New search for: Gupta, N.
    New search for: Stucky, G. D.
    New search for: Hawker, C. J.

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    Highly Versatile and Robust Materials for Soft Imprint Lithography Based on Thiol-ene Click Chemistry

    New search for: Campos, L. M.
    New search for: Meinel, I.
    New search for: Guino, R. G.
    New search for: Schierhorn, M.
    New search for: Gupta, N.
    New search for: Stucky, G. D.
    New search for: Hawker, C. J.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Highly Versatile and Robust Materials for Soft Imprint Lithography Based on Thiol-ene Click Chemistry

    New search for: Campos, L. M.
    New search for: Meinel, I.
    New search for: Guino, R. G.
    New search for: Schierhorn, M.
    New search for: Gupta, N.
    New search for: Stucky, G. D.
    New search for: Hawker, C. J.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

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    Document information
    Title:

    Highly Versatile and Robust Materials for Soft Imprint Lithography Based on Thiol-ene Click Chemistry

    Contributors:

    Campos, L. M. (author) / Meinel, I. (author) / Guino, R. G. (author) / Schierhorn, M. (author) / Gupta, N. (author) / Stucky, G. D. (author) / Hawker, C. J. (author)

    Published in:

    ADVANCED MATERIALS -DEERFIELD BEACH THEN WEINHEIM- ; 20 ; 3728-3733

    Publication date:

    2008-01-01

    Size:

    6 pages

    ISSN:

    0935-9648

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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