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Fluorine-doped SiO2 and fluorocarbon low-k dielectrics investigated by SIMS
Fluorine-doped SiO2 and fluorocarbon low-k dielectrics investigated by SIMS
Fluorine-doped SiO2 and fluorocarbon low-k dielectrics investigated by SIMS
Cwil, M. (author) / Kalisz, M. (author) / Konarski, P. (author)
APPLIED SURFACE SCIENCE ; 255 ; 1334-1337
2008-01-01
4 pages
Article (Journal)
English
DDC:
621.35
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