Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Fluorine-doped SiO2 and fluorocarbon low-k dielectrics investigated by SIMS
Fluorine-doped SiO2 and fluorocarbon low-k dielectrics investigated by SIMS
Fluorine-doped SiO2 and fluorocarbon low-k dielectrics investigated by SIMS
Cwil, M. (Autor:in) / Kalisz, M. (Autor:in) / Konarski, P. (Autor:in)
APPLIED SURFACE SCIENCE ; 255 ; 1334-1337
01.01.2008
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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