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Influence of RF power and fluorine doping on the properties of sputtered ITO thin films

Nisha, M. / Jayaraj, M. K.

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Influence of RF power and fluorine doping on the properties of sputtered ITO thin films

Nisha, M. / Jayaraj, M. K.

Influence of RF power and fluorine doping on the properties of sputtered ITO thin films

Nisha, M. / Jayaraj, M. K.

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Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Influence of RF power and fluorine doping on the properties of sputtered ITO thin films

Contributors:

Nisha, M. (author) / Jayaraj, M. K. (author)

Published in:

APPLIED SURFACE SCIENCE ; 255 ; 1790-1795

Publication date:

2008-01-01

Size:

6 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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