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Influence of ejection angle on residual stress and optical properties of sputtering Ta2O5 thin films
Influence of ejection angle on residual stress and optical properties of sputtering Ta2O5 thin films
Influence of ejection angle on residual stress and optical properties of sputtering Ta2O5 thin films
Tien, C. L. (author)
APPLIED SURFACE SCIENCE ; 255 ; 2890-2895
2008-01-01
6 pages
Article (Journal)
English
DDC:
621.35
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