Comparision of residual stress and optical properties in Ta2O5 thin films deposited by single and dual ion beam sputtering: Fid-Bau Portal

Comparision of residual stress and optical properties in Ta2O5 thin films deposited by single and dual ion beam sputtering

Yoon, S. G. / Kim, Y. T. / Kim, H. K. / Kim, M. J. / Lee, H. M. / Yoon, D. H.

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Comparision of residual stress and optical properties in Ta2O5 thin films deposited by single and dual ion beam sputtering

Yoon, S. G. / Kim, Y. T. / Kim, H. K. / Kim, M. J. / Lee, H. M. / Yoon, D. H.

Comparision of residual stress and optical properties in Ta2O5 thin films deposited by single and dual ion beam sputtering

Yoon, S. G. / Kim, Y. T. / Kim, H. K. / Kim, M. J. / Lee, H. M. / Yoon, D. H.

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Document information

Title:

Comparision of residual stress and optical properties in Ta2O5 thin films deposited by single and dual ion beam sputtering

Contributors:

Yoon, S. G. (author) / Kim, Y. T. (author) / Kim, H. K. (author) / Kim, M. J. (author) / Lee, H. M. (author) / Yoon, D. H. (author)

Published in:

MATERIALS SCIENCE AND ENGINEERING B -LAUSANNE- ; 118 ; 234-237

Publication date:

2005-01-01

Size:

4 pages

ISSN:

0921-5107

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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