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Growth temperature dependences of InN films grown by MOCVD

Yang, C. / Wang, X. / Xiao, H. / Zhang, X. / Hu, G. / Ran, J. / Wang, C. / Li, J. / Wang, Z.

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Growth temperature dependences of InN films grown by MOCVD

Yang, C. / Wang, X. / Xiao, H. / Zhang, X. / Hu, G. / Ran, J. / Wang, C. / Li, J. / Wang, Z.

Growth temperature dependences of InN films grown by MOCVD

Yang, C. / Wang, X. / Xiao, H. / Zhang, X. / Hu, G. / Ran, J. / Wang, C. / Li, J. / Wang, Z.

Access

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Growth temperature dependences of InN films grown by MOCVD

Contributors:

Yang, C. (author) / Wang, X. (author) / Xiao, H. (author) / Zhang, X. (author) / Hu, G. (author) / Ran, J. (author) / Wang, C. (author) / Li, J. (author) / Wang, Z. (author)

Published in:

APPLIED SURFACE SCIENCE ; 255 ; 3149-3152

Publication date:

2008-01-01

Size:

4 pages

ISSN:

Type of media:

Article (Journal)

Type of material:

Print

Language:

English

Classification:

© Metadata Copyright the British Library Board and other contributors. All rights reserved.

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