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Room-temperature deposition of transparent conducting Al-doped ZnO films by RF magnetron sputtering method

Yang, W. / Liu, Z. / Peng, D. L. / Zhang, F. / Huang, H. / Xie, Y. / Wu, Z.

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Room-temperature deposition of transparent conducting Al-doped ZnO films by RF magnetron sputtering method

Yang, W. / Liu, Z. / Peng, D. L. / Zhang, F. / Huang, H. / Xie, Y. / Wu, Z.

Room-temperature deposition of transparent conducting Al-doped ZnO films by RF magnetron sputtering method

Yang, W. / Liu, Z. / Peng, D. L. / Zhang, F. / Huang, H. / Xie, Y. / Wu, Z.

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Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Room-temperature deposition of transparent conducting Al-doped ZnO films by RF magnetron sputtering method

Contributors:

Yang, W. (author) / Liu, Z. (author) / Peng, D. L. (author) / Zhang, F. (author) / Huang, H. (author) / Xie, Y. (author) / Wu, Z. (author)

Published in:

APPLIED SURFACE SCIENCE ; 255 ; 5669-5673

Publication date:

2009-01-01

Size:

5 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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