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    Pulsed plasma ion source to create Si nanocrystals in SiO2 substrates

    New search for: Lorusso, A.
    New search for: Nassisi, V.
    New search for: Congedo, G.
    New search for: Lovergine, N.
    New search for: Velardi, L.
    New search for: Prete, P.

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    Pulsed plasma ion source to create Si nanocrystals in SiO2 substrates

    New search for: Lorusso, A.
    New search for: Nassisi, V.
    New search for: Congedo, G.
    New search for: Lovergine, N.
    New search for: Velardi, L.
    New search for: Prete, P.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Pulsed plasma ion source to create Si nanocrystals in SiO2 substrates

    New search for: Lorusso, A.
    New search for: Nassisi, V.
    New search for: Congedo, G.
    New search for: Lovergine, N.
    New search for: Velardi, L.
    New search for: Prete, P.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Pulsed plasma ion source to create Si nanocrystals in SiO2 substrates

    Contributors:

    Lorusso, A. (author) / Nassisi, V. (author) / Congedo, G. (author) / Lovergine, N. (author) / Velardi, L. (author) / Prete, P. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 255 ; 5401-5404

    Publication date:

    2009-01-01

    Size:

    4 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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