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    Hierarchically Ordered Topographic Patterns via Plasmonic Mask Photolithography

    New search for: Kim, W. S.
    New search for: Jia, L.
    New search for: Thomas, E. L.

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    Hierarchically Ordered Topographic Patterns via Plasmonic Mask Photolithography

    New search for: Kim, W. S.
    New search for: Jia, L.
    New search for: Thomas, E. L.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Hierarchically Ordered Topographic Patterns via Plasmonic Mask Photolithography

    New search for: Kim, W. S.
    New search for: Jia, L.
    New search for: Thomas, E. L.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

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    Document information
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    Document information
    Title:

    Hierarchically Ordered Topographic Patterns via Plasmonic Mask Photolithography

    Contributors:

    Kim, W. S. (author) / Jia, L. (author) / Thomas, E. L. (author)

    Published in:

    ADVANCED MATERIALS -DEERFIELD BEACH THEN WEINHEIM- ; 21 ; 1921-1926

    Publication date:

    2009-01-01

    Size:

    6 pages

    ISSN:

    0935-9648

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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