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    Photoresist materials for 157-nm photolithography

    New search for: Sarantopoulou, E.
    New search for: Cefalas, A. C.
    New search for: Argitis, P.
    New search for: Gogolides, E.

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    Photoresist materials for 157-nm photolithography

    New search for: Sarantopoulou, E.
    New search for: Cefalas, A. C.
    New search for: Argitis, P.
    New search for: Gogolides, E.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Photoresist materials for 157-nm photolithography

    New search for: Sarantopoulou, E.
    New search for: Cefalas, A. C.
    New search for: Argitis, P.
    New search for: Gogolides, E.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Photoresist materials for 157-nm photolithography

    Contributors:

    Sarantopoulou, E. (author) / Cefalas, A. C. (author) / Argitis, P. (author) / Gogolides, E. (author)

    Published in:

    MATERIALS SCIENCE AND ENGINEERING -AMSTERDAM THEN LAUSANNE- C ; 15 ; 159-161

    Publication date:

    2001-01-01

    Size:

    3 pages

    ISSN:

    0928-4931

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.1 / 660

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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