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    AlON/SiO~2 Stacked Gate Dielectrics for 4H-SiC MIS Devices

    New search for: Hosoi, T.
    New search for: Harada, M.
    New search for: Kagei, Y.
    New search for: Watanabe, Y.
    New search for: Shimura, T.
    New search for: Mitani, S.
    New search for: Nakano, Y.
    New search for: Nakamura, T.
    New search for: Watanabe, H.

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    AlON/SiO~2 Stacked Gate Dielectrics for 4H-SiC MIS Devices

    New search for: Hosoi, T.
    New search for: Harada, M.
    New search for: Kagei, Y.
    New search for: Watanabe, Y.
    New search for: Shimura, T.
    New search for: Mitani, S.
    New search for: Nakano, Y.
    New search for: Nakamura, T.
    New search for: Watanabe, H.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    AlON/SiO~2 Stacked Gate Dielectrics for 4H-SiC MIS Devices

    New search for: Hosoi, T.
    New search for: Harada, M.
    New search for: Kagei, Y.
    New search for: Watanabe, Y.
    New search for: Shimura, T.
    New search for: Mitani, S.
    New search for: Nakano, Y.
    New search for: Nakamura, T.
    New search for: Watanabe, H.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
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    Document information
    Title:

    AlON/SiO~2 Stacked Gate Dielectrics for 4H-SiC MIS Devices

    Contributors:

    Hosoi, T. (author) / Harada, M. (author) / Kagei, Y. (author) / Watanabe, Y. (author) / Shimura, T. (author) / Mitani, S. (author) / Nakano, Y. (author) / Nakamura, T. (author) / Watanabe, H. (author)

    Published in:

    MATERIALS SCIENCE FORUM ; 615/617 ; 541-544

    Publication date:

    2009-01-01

    Size:

    4 pages

    ISSN:

    0255-5476

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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