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    Role of the MOCVD deposition conditions on physico-chemical properties of tetragonal ZrO2 thin films

    New search for: Galicka-Fau, K.
    New search for: Legros, C.
    New search for: Andrieux, M.
    New search for: Brunet, M.
    New search for: Szade, J.
    New search for: Garry, G.

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    Role of the MOCVD deposition conditions on physico-chemical properties of tetragonal ZrO2 thin films

    New search for: Galicka-Fau, K.
    New search for: Legros, C.
    New search for: Andrieux, M.
    New search for: Brunet, M.
    New search for: Szade, J.
    New search for: Garry, G.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Role of the MOCVD deposition conditions on physico-chemical properties of tetragonal ZrO2 thin films

    New search for: Galicka-Fau, K.
    New search for: Legros, C.
    New search for: Andrieux, M.
    New search for: Brunet, M.
    New search for: Szade, J.
    New search for: Garry, G.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

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    Document information
    Title:

    Role of the MOCVD deposition conditions on physico-chemical properties of tetragonal ZrO2 thin films

    Contributors:

    Galicka-Fau, K. (author) / Legros, C. (author) / Andrieux, M. (author) / Brunet, M. (author) / Szade, J. (author) / Garry, G. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 255 ; 8986-8994

    Publication date:

    2009-01-01

    Size:

    9 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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