A platform for research: civil engineering, architecture and urbanism
Lining up flexible electronics: A dual-tone photoresist enables multiwavelength photolithography
Lining up flexible electronics: A dual-tone photoresist enables multiwavelength photolithography
Lining up flexible electronics: A dual-tone photoresist enables multiwavelength photolithography
MATERIALS WORLD ; 17 ; 5
2009-01-01
5 pages
Article (Journal)
English
DDC:
620.11
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Photoresist materials for 157-nm photolithography
British Library Online Contents | 2001
|British Library Online Contents | 2017
|Simple transfer of Ag nanowires by dry film photoresist for paper-based flexible electronics
British Library Online Contents | 2017
|Adjustable flexible segment lining
British Library Online Contents | 2010
|Flexible lining or NATM versus stiff lining or sprayed concrete lining (SCL)
British Library Conference Proceedings | 1998
|