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The interface reaction of high-k La2Hf2O7/Si thin film grown by pulsed laser deposition
The interface reaction of high-k La2Hf2O7/Si thin film grown by pulsed laser deposition
The interface reaction of high-k La2Hf2O7/Si thin film grown by pulsed laser deposition
APPLIED SURFACE SCIENCE ; 256 ; 838-841
2009-01-01
4 pages
Article (Journal)
English
DDC:
621.35
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