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    XPS and IPE analysis of HfO~2 band alignment with high-mobility semiconductors

    New search for: Perego, M.
    New search for: Seguini, G.
    New search for: Fanciulli, M.

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    XPS and IPE analysis of HfO~2 band alignment with high-mobility semiconductors

    New search for: Perego, M.
    New search for: Seguini, G.
    New search for: Fanciulli, M.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    XPS and IPE analysis of HfO~2 band alignment with high-mobility semiconductors

    New search for: Perego, M.
    New search for: Seguini, G.
    New search for: Fanciulli, M.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

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    Document information
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    Document information
    Title:

    XPS and IPE analysis of HfO~2 band alignment with high-mobility semiconductors

    Contributors:

    Perego, M. (author) / Seguini, G. (author) / Fanciulli, M. (author)

    Published in:

    MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 11 ; 221-225

    Publication date:

    2008-01-01

    Size:

    5 pages

    ISSN:

    1369-8001

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.38152

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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