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Nanoscale strain characterisation for ultimate CMOS and beyond
Nanoscale strain characterisation for ultimate CMOS and beyond
Nanoscale strain characterisation for ultimate CMOS and beyond
Olsen, S.H. (author) / Dobrosz, P. (author) / Agaiby, R.M.B. (author) / Tsang, Y.L. (author) / Alatise, O. (author) / Bull, S.J. (author) / O Neill, A.G. (author) / Moselund, K.E. (author) / Ionescu, A.M. (author) / Majhi, P. (author)
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 11 ; 271-278
2008-01-01
8 pages
Article (Journal)
English
DDC:
621.38152
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