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High-dielectric constant AION prepared by RF gas-timing sputtering for high capacitance density
High-dielectric constant AION prepared by RF gas-timing sputtering for high capacitance density
High-dielectric constant AION prepared by RF gas-timing sputtering for high capacitance density
Poyai, A. (author) / Bunjongpru, W. (author) / Klunngien, N. (author) / Porntheerapat, S. (author) / Hruanan, C. (author) / Sopitpan, S. (author) / Nukeaw, J. (author)
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 11 ; 319-323
2008-01-01
5 pages
Article (Journal)
English
DDC:
621.38152
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