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    Influence of negative ion resputtering on Al-doped ZnO thin films prepared by mid-frequency magnetron sputtering

    New search for: Cai, Y.
    New search for: Liu, W.
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    Influence of negative ion resputtering on Al-doped ZnO thin films prepared by mid-frequency magnetron sputtering

    New search for: Cai, Y.
    New search for: Liu, W.
    New search for: He, Q.
    New search for: Zhang, Y.
    New search for: Yu, T.
    New search for: Sun, Y.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Influence of negative ion resputtering on Al-doped ZnO thin films prepared by mid-frequency magnetron sputtering

    New search for: Cai, Y.
    New search for: Liu, W.
    New search for: He, Q.
    New search for: Zhang, Y.
    New search for: Yu, T.
    New search for: Sun, Y.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

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    Document information
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    Document information
    Title:

    Influence of negative ion resputtering on Al-doped ZnO thin films prepared by mid-frequency magnetron sputtering

    Contributors:

    Cai, Y. (author) / Liu, W. (author) / He, Q. (author) / Zhang, Y. (author) / Yu, T. (author) / Sun, Y. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 256 ; 1694-1697

    Publication date:

    2010-01-01

    Size:

    4 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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