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    A fundamental model proposed for material removal in chemicalmechanical polishing

    New search for: Xin, J.
    New search for: Cai, W.
    New search for: Tichy, J. A.

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    A fundamental model proposed for material removal in chemicalmechanical polishing

    New search for: Xin, J.
    New search for: Cai, W.
    New search for: Tichy, J. A.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    A fundamental model proposed for material removal in chemicalmechanical polishing

    New search for: Xin, J.
    New search for: Cai, W.
    New search for: Tichy, J. A.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    A fundamental model proposed for material removal in chemicalmechanical polishing

    Contributors:

    Xin, J. (author) / Cai, W. (author) / Tichy, J. A. (author)

    Published in:

    WEAR -LAUSANNE- ; 268 ; 837-844

    Publication date:

    2010-01-01

    Size:

    8 pages

    ISSN:

    0043-1648

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11292

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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