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Characterization of Lanthanoid and Aluminum Based Oxide Film for Wide Bandgap Semiconductors
Characterization of Lanthanoid and Aluminum Based Oxide Film for Wide Bandgap Semiconductors
Characterization of Lanthanoid and Aluminum Based Oxide Film for Wide Bandgap Semiconductors
Aoki, H. (author) / Komatsu, N. (author) / Honjo, M. (author) / Masumoto, K. (author) / Kimura, C. (author) / Sugino, T. (author) / Chandra, T. / Wanderka, N. / Reimers, W. / Ionescu, M.
2010-01-01
6 pages
Article (Journal)
English
DDC:
620.11
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