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    Effect of nitrogen doping on the properties of AlSiO film for wide bandgap semiconductors

    New search for: Komatsu, N.
    New search for: Tanaka, H.
    New search for: Aoki, H.
    New search for: Masumoto, K.
    New search for: Honjo, M.
    New search for: Kimura, C.
    New search for: Okumura, Y.
    New search for: Sugino, T.

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    Effect of nitrogen doping on the properties of AlSiO film for wide bandgap semiconductors

    New search for: Komatsu, N.
    New search for: Tanaka, H.
    New search for: Aoki, H.
    New search for: Masumoto, K.
    New search for: Honjo, M.
    New search for: Kimura, C.
    New search for: Okumura, Y.
    New search for: Sugino, T.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Effect of nitrogen doping on the properties of AlSiO film for wide bandgap semiconductors

    New search for: Komatsu, N.
    New search for: Tanaka, H.
    New search for: Aoki, H.
    New search for: Masumoto, K.
    New search for: Honjo, M.
    New search for: Kimura, C.
    New search for: Okumura, Y.
    New search for: Sugino, T.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
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    Document information
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    Document information
    Title:

    Effect of nitrogen doping on the properties of AlSiO film for wide bandgap semiconductors

    Contributors:

    Komatsu, N. (author) / Tanaka, H. (author) / Aoki, H. (author) / Masumoto, K. (author) / Honjo, M. (author) / Kimura, C. (author) / Okumura, Y. (author) / Sugino, T. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 257 ; 1437-1440

    Publication date:

    2010-01-01

    Size:

    4 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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