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Formation of High Density Metal Silicide Nanodots on Ultrathin SiO~2 for Floating Gate Memory Application
Formation of High Density Metal Silicide Nanodots on Ultrathin SiO~2 for Floating Gate Memory Application
Formation of High Density Metal Silicide Nanodots on Ultrathin SiO~2 for Floating Gate Memory Application
Miyazaki, S. (author) / Ikeda, M. (author) / Makihara, K. (author) / Shimanoe, K. (author) / Matsumoto, R. (author) / Chandra, T. / Wanderka, N. / Reimers, W. / Ionescu, M.
2010-01-01
6 pages
Article (Journal)
English
DDC:
620.11
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