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Simulation of Gas Flow Field in HFCVD System for CVD Diamond Growth

Lin, H.Q. / Lu, W.Z. / Zuo, D.W. / Yang, C. / Xu, F.

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Simulation of Gas Flow Field in HFCVD System for CVD Diamond Growth

Lin, H.Q. / Lu, W.Z. / Zuo, D.W. / Yang, C. / Xu, F.

Simulation of Gas Flow Field in HFCVD System for CVD Diamond Growth

Lin, H.Q. / Lu, W.Z. / Zuo, D.W. / Yang, C. / Xu, F.

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Document information

Title:

Simulation of Gas Flow Field in HFCVD System for CVD Diamond Growth

Contributors:

Lin, H.Q. (author) / Lu, W.Z. (author) / Zuo, D.W. (author) / Yang, C. (author) / Xu, F. (author) / Yao, Y. / Zuo, D. / Xu, X.

Published in:

Machining and Advanced Manufacturing Technology X ; 21-24

KEY ENGINEERING MATERIALS ; 431/432

Publication date:

2010-01-01

Size:

4 pages

ISSN:

1013-9826

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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