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Coating of TiO2 thin films on particles by a plasma chemical vapor deposition process

Kim, D. J. / Kang, J. Y. / Kim, K. S.

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Coating of TiO2 thin films on particles by a plasma chemical vapor deposition process

Kim, D. J. / Kang, J. Y. / Kim, K. S.

Coating of TiO2 thin films on particles by a plasma chemical vapor deposition process

Kim, D. J. / Kang, J. Y. / Kim, K. S.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Coating of TiO2 thin films on particles by a plasma chemical vapor deposition process

Contributors:

Kim, D. J. (author) / Kang, J. Y. (author) / Kim, K. S. (author)

Published in:

ADVANCED POWDER TECHNOLOGY ; 21 ; 136-140

Publication date:

2010-01-01

Size:

5 pages

ISSN:

0921-8831

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.43

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