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    Atomistic study of deposition process of Al thin film on Cu substrate

    New search for: Cao, Y.
    New search for: Zhang, J.
    New search for: Sun, T.
    New search for: Yan, Y.
    New search for: Yu, F.

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    Atomistic study of deposition process of Al thin film on Cu substrate

    New search for: Cao, Y.
    New search for: Zhang, J.
    New search for: Sun, T.
    New search for: Yan, Y.
    New search for: Yu, F.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Atomistic study of deposition process of Al thin film on Cu substrate

    New search for: Cao, Y.
    New search for: Zhang, J.
    New search for: Sun, T.
    New search for: Yan, Y.
    New search for: Yu, F.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Atomistic study of deposition process of Al thin film on Cu substrate

    Contributors:

    Cao, Y. (author) / Zhang, J. (author) / Sun, T. (author) / Yan, Y. (author) / Yu, F. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 256 ; 5993-5997

    Publication date:

    2010-01-01

    Size:

    5 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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