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Microstructure and strain distribution in freestanding Si membrane strained by SixNy deposition
Microstructure and strain distribution in freestanding Si membrane strained by SixNy deposition
Microstructure and strain distribution in freestanding Si membrane strained by SixNy deposition
Gao, H. (author) / Ikeda, K. i. (author) / Hata, S. (author) / Nakashima, H. (author) / Wang, D. (author)
MATERIALS SCIENCE AND ENGINEERING A ; 527 ; 6633-6637
2010-01-01
5 pages
Article (Journal)
English
DDC:
620.11
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