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Thermal stability of alumina thin films containing g-Al2O3 phase prepared by reactive magnetron sputtering
Thermal stability of alumina thin films containing g-Al2O3 phase prepared by reactive magnetron sputtering
Thermal stability of alumina thin films containing g-Al2O3 phase prepared by reactive magnetron sputtering
Musil, J. (author) / Blazek, J. (author) / Zeman, P. (author) / Proksova, S. (author) / Sasek, M. (author) / Cerstvy, R. (author)
APPLIED SURFACE SCIENCE ; 257 ; 1058-1062
2010-01-01
5 pages
Article (Journal)
English
DDC:
621.35
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