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Thermal stability of alumina thin films containing g-Al2O3 phase prepared by reactive magnetron sputtering
Thermal stability of alumina thin films containing g-Al2O3 phase prepared by reactive magnetron sputtering
Thermal stability of alumina thin films containing g-Al2O3 phase prepared by reactive magnetron sputtering
Musil, J. (Autor:in) / Blazek, J. (Autor:in) / Zeman, P. (Autor:in) / Proksova, S. (Autor:in) / Sasek, M. (Autor:in) / Cerstvy, R. (Autor:in)
APPLIED SURFACE SCIENCE ; 257 ; 1058-1062
01.01.2010
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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