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    Influence of jet-to-substrate distance on plasma etching of polyamide 6 films with atmospheric pressure plasma

    New search for: Gao, Z.

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    Influence of jet-to-substrate distance on plasma etching of polyamide 6 films with atmospheric pressure plasma

    New search for: Gao, Z.

    Access

    Access via TIB
    Check availability in my library
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    Influence of jet-to-substrate distance on plasma etching of polyamide 6 films with atmospheric pressure plasma

    New search for: Gao, Z.

    Access

    Access via TIB
    Check availability in my library
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    Document information
    Title:

    Influence of jet-to-substrate distance on plasma etching of polyamide 6 films with atmospheric pressure plasma

    Contributors:

    Gao, Z. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 257 ; 2531-2535

    Publication date:

    2011-01-01

    Size:

    5 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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