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    Characterization of a controlled electroless deposition of copper thin film on germanium and silicon surfaces

    New search for: Scudiero, L.
    New search for: Fasasi, A.
    New search for: Griffiths, P. R.

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    Characterization of a controlled electroless deposition of copper thin film on germanium and silicon surfaces

    New search for: Scudiero, L.
    New search for: Fasasi, A.
    New search for: Griffiths, P. R.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Characterization of a controlled electroless deposition of copper thin film on germanium and silicon surfaces

    New search for: Scudiero, L.
    New search for: Fasasi, A.
    New search for: Griffiths, P. R.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
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    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Characterization of a controlled electroless deposition of copper thin film on germanium and silicon surfaces

    Contributors:

    Scudiero, L. (author) / Fasasi, A. (author) / Griffiths, P. R. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 257 ; 4422-4427

    Publication date:

    2011-01-01

    Size:

    6 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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