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    Influence of oxygen partial pressure on the growth of Al-doped zinc oxide films by reactive MF magnetron sputtering

    New search for: Hong, R.
    New search for: Jiang, X.

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    Influence of oxygen partial pressure on the growth of Al-doped zinc oxide films by reactive MF magnetron sputtering

    New search for: Hong, R.
    New search for: Jiang, X.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Influence of oxygen partial pressure on the growth of Al-doped zinc oxide films by reactive MF magnetron sputtering

    New search for: Hong, R.
    New search for: Jiang, X.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

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    Document information
    Similar titles

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    Document information
    Title:

    Influence of oxygen partial pressure on the growth of Al-doped zinc oxide films by reactive MF magnetron sputtering

    Contributors:

    Hong, R. (author) / Jiang, X. (author)

    Published in:

    INTERNATIONAL JOURNAL OF MATERIALS RESEARCH ; 102 ; 143-146

    Publication date:

    2011-01-01

    Size:

    4 pages

    ISSN:

    1862-5282

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  669.9

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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