Design and Fabrication of Novel Photonic Crystal Waveguide Consisting of Si-Ion Implanted SiO~2 Layers: Fid-Bau Portal

Design and Fabrication of Novel Photonic Crystal Waveguide Consisting of Si-Ion Implanted SiO~2 Layers

Umenyi, A.V. / Honmi, M. / Kawashiri, S. / Shinagawa, T. / Miura, K. / Hanaizumi, O. / Yamamoto, S. / Inouye, A. / Yoshikawa, M.

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Design and Fabrication of Novel Photonic Crystal Waveguide Consisting of Si-Ion Implanted SiO~2 Layers

Umenyi, A.V. / Honmi, M. / Kawashiri, S. / Shinagawa, T. / Miura, K. / Hanaizumi, O. / Yamamoto, S. / Inouye, A. / Yoshikawa, M.

Design and Fabrication of Novel Photonic Crystal Waveguide Consisting of Si-Ion Implanted SiO~2 Layers

Umenyi, A.V. / Honmi, M. / Kawashiri, S. / Shinagawa, T. / Miura, K. / Hanaizumi, O. / Yamamoto, S. / Inouye, A. / Yoshikawa, M.

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Title:

Design and Fabrication of Novel Photonic Crystal Waveguide Consisting of Si-Ion Implanted SiO~2 Layers

Contributors:

Umenyi, A.V. (author) / Honmi, M. (author) / Kawashiri, S. (author) / Shinagawa, T. (author) / Miura, K. (author) / Hanaizumi, O. (author) / Yamamoto, S. (author) / Inouye, A. (author) / Yoshikawa, M. (author) / Hanaizumi, O.

Published in:

Silicon Science and Advanced Micro-Device Engineering I ; 168-172

KEY ENGINEERING MATERIALS ; 459

Publication date:

2011-01-01

Size:

5 pages

ISSN:

1013-9826

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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