Enhanced field emission characteristics of boron doped diamond films grown by microwave plasma assisted chemical vapor deposition: Fid-Bau Portal

Enhanced field emission characteristics of boron doped diamond films grown by microwave plasma assisted chemical vapor deposition

Koinkar, P. M. / Patil, S. S. / Kim, T. G. / Yonekura, D. / More, M. A. / Joag, D. S. / Murakami, R. i.

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Enhanced field emission characteristics of boron doped diamond films grown by microwave plasma assisted chemical vapor deposition

Koinkar, P. M. / Patil, S. S. / Kim, T. G. / Yonekura, D. / More, M. A. / Joag, D. S. / Murakami, R. i.

Enhanced field emission characteristics of boron doped diamond films grown by microwave plasma assisted chemical vapor deposition

Koinkar, P. M. / Patil, S. S. / Kim, T. G. / Yonekura, D. / More, M. A. / Joag, D. S. / Murakami, R. i.

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Document information

Title:

Enhanced field emission characteristics of boron doped diamond films grown by microwave plasma assisted chemical vapor deposition

Contributors:

Koinkar, P. M. (author) / Patil, S. S. (author) / Kim, T. G. (author) / Yonekura, D. (author) / More, M. A. (author) / Joag, D. S. (author) / Murakami, R. i. (author)

Published in:

APPLIED SURFACE SCIENCE ; 257 ; 1854-1858

Publication date:

2011-01-01

Size:

5 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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