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    Refractive index behavior of boron-doped silica films by plasma-enhanced chemical vapor deposition

    New search for: Horng, R. H.
    New search for: Chen, F.
    New search for: Wuu, D. S.
    New search for: Lin, T. Y.

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    Refractive index behavior of boron-doped silica films by plasma-enhanced chemical vapor deposition

    New search for: Horng, R. H.
    New search for: Chen, F.
    New search for: Wuu, D. S.
    New search for: Lin, T. Y.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Refractive index behavior of boron-doped silica films by plasma-enhanced chemical vapor deposition

    New search for: Horng, R. H.
    New search for: Chen, F.
    New search for: Wuu, D. S.
    New search for: Lin, T. Y.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Refractive index behavior of boron-doped silica films by plasma-enhanced chemical vapor deposition

    Contributors:

    Horng, R. H. (author) / Chen, F. (author) / Wuu, D. S. (author) / Lin, T. Y. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 92 ; 387-390

    Publication date:

    1996-01-01

    Size:

    4 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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