Preparation and character of textured ZnO:Al thin films deposited on flexible substrates by RF magnetron sputtering: Fid-Bau Portal

Preparation and character of textured ZnO:Al thin films deposited on flexible substrates by RF magnetron sputtering

Wang, X. j. / Wang, H. / Zhou, W. l. / Li, G. x. / Yu, J.

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Preparation and character of textured ZnO:Al thin films deposited on flexible substrates by RF magnetron sputtering

Wang, X. j. / Wang, H. / Zhou, W. l. / Li, G. x. / Yu, J.

Preparation and character of textured ZnO:Al thin films deposited on flexible substrates by RF magnetron sputtering

Wang, X. j. / Wang, H. / Zhou, W. l. / Li, G. x. / Yu, J.

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Document information

Title:

Preparation and character of textured ZnO:Al thin films deposited on flexible substrates by RF magnetron sputtering

Contributors:

Wang, X. j. (author) / Wang, H. (author) / Zhou, W. l. (author) / Li, G. x. (author) / Yu, J. (author)

Published in:

MATERIALS LETTERS ; 65 ; 2039-2042

Publication date:

2011-01-01

Size:

4 pages

ISSN:

0167-577X

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.1105 / 530

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