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    Corrigendum to ''The properties of plasma-enhanced atomic layer deposition (ALD) ZnO thin films and comparison with thermal ALD'' [Appl. Surf. Sci. 257 (2011) 3776-3779]

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    Corrigendum to ''The properties of plasma-enhanced atomic layer deposition (ALD) ZnO thin films and comparison with thermal ALD'' [Appl. Surf. Sci. 257 (2011) 3776-3779]

    New search for: Kim, D.
    New search for: Kang, H.
    New search for: Kim, J. M.
    New search for: Kim, H.

    Access

    Access via TIB
    Check availability in my library
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    Corrigendum to ''The properties of plasma-enhanced atomic layer deposition (ALD) ZnO thin films and comparison with thermal ALD'' [Appl. Surf. Sci. 257 (2011) 3776-3779]

    New search for: Kim, D.
    New search for: Kang, H.
    New search for: Kim, J. M.
    New search for: Kim, H.

    Access

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    Document information
    Title:

    Corrigendum to ''The properties of plasma-enhanced atomic layer deposition (ALD) ZnO thin films and comparison with thermal ALD'' [Appl. Surf. Sci. 257 (2011) 3776-3779]

    Contributors:

    Kim, D. (author) / Kang, H. (author) / Kim, J. M. (author) / Kim, H. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 257 ; 7906

    Publication date:

    2011-01-01

    Size:

    7906 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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