Structural and optical properties of GaN thin films grown on Al2O3 substrates by MOCVD at different reactor pressures: Fid-Bau Portal

Structural and optical properties of GaN thin films grown on Al2O3 substrates by MOCVD at different reactor pressures

Guillen-Cervantes, A. / Rivera-Alvarez, Z. / Lopez-Lopez, M. / Ponce-Pedraza, A. / Guarneros, C. / Sanchez-Resendiz, V. M.

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Structural and optical properties of GaN thin films grown on Al2O3 substrates by MOCVD at different reactor pressures

Guillen-Cervantes, A. / Rivera-Alvarez, Z. / Lopez-Lopez, M. / Ponce-Pedraza, A. / Guarneros, C. / Sanchez-Resendiz, V. M.

Structural and optical properties of GaN thin films grown on Al2O3 substrates by MOCVD at different reactor pressures

Guillen-Cervantes, A. / Rivera-Alvarez, Z. / Lopez-Lopez, M. / Ponce-Pedraza, A. / Guarneros, C. / Sanchez-Resendiz, V. M.

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Title:

Structural and optical properties of GaN thin films grown on Al2O3 substrates by MOCVD at different reactor pressures

Contributors:

Guillen-Cervantes, A. (author) / Rivera-Alvarez, Z. (author) / Lopez-Lopez, M. (author) / Ponce-Pedraza, A. (author) / Guarneros, C. (author) / Sanchez-Resendiz, V. M. (author)

Published in:

APPLIED SURFACE SCIENCE ; 258 ; 1267-1271

Publication date:

2011-01-01

Size:

5 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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