Structural, electrical and optical properties of ZnO:AlF3 thin films deposited by RF magnetron sputtering: Fid-Bau Portal

Structural, electrical and optical properties of ZnO:AlF3 thin films deposited by RF magnetron sputtering

Lin, T. C. / Huang, W. C. / Liu, C. H. / Chang, S. C.

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Structural, electrical and optical properties of ZnO:AlF3 thin films deposited by RF magnetron sputtering

Lin, T. C. / Huang, W. C. / Liu, C. H. / Chang, S. C.

Structural, electrical and optical properties of ZnO:AlF3 thin films deposited by RF magnetron sputtering

Lin, T. C. / Huang, W. C. / Liu, C. H. / Chang, S. C.

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Document information

Title:

Structural, electrical and optical properties of ZnO:AlF3 thin films deposited by RF magnetron sputtering

Contributors:

Lin, T. C. (author) / Huang, W. C. (author) / Liu, C. H. (author) / Chang, S. C. (author)

Published in:

APPLIED SURFACE SCIENCE ; 258 ; 3302-3308

Publication date:

2012-01-01

Size:

7 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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